High rate deposition for the formation of high quality optical coatings
US8865271B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 2004 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Mar 3, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
High rate deposition methods comprise depositing a powder coating from a product flow. The product flow results from a chemical reaction within the flow. Some of the powder coatings consolidate under appropriate conditions into an optical coating. The substrate can have a first optical coating onto which the powder coating is placed. The resulting optical coating following consolidation can have a large index-of-refraction difference with the underlying first optical coating, high thickness and index-of-refraction uniformity across the substrate and high thickness and index-of-refraction uniformity between coatings formed on different substrates under equivalent conditions. In some embodiments, the deposition can result in a powder coating of at least about 100 nm in no more than about 30 minutes with a substrate having a surface area of at least about 25 square centimeters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.