Pattern position detection method, pattern position detection system, and image quality adjustment technique using the method and system
US8866914B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2013 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Mar 18, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09G2360/145
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Provided is a pattern position detection method that allows detecting positions of patterns used for alignment with high accuracy. According to the pattern position detection method of the present invention, patterns are displayed on a liquid crystal panel (2) and captured by a camera (3). A black image is displayed on the liquid crystal panel (2) and captured by the camera (3) using a shutter speed or an f-number used when capturing the patterns. Based on a difference between a captured image of the patterns and a captured image of the black image, positions of images of the patterns on an imaging surface of the camera (3) are detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.