Optical vacuum ultra-violet wavelength nanoimprint metrology
US8867041B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 15, 2012 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Nov 12, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical metrology apparatus for measuring nanoimprint structures using Vacuum Ultra-Violet (VUV) light is described. Focusing optics focus light onto the sample and collect the light reflected from the sample so as to record an optical response from nanoimprint structures on the sample, wherein the nanoimprint structures have an orientation that varies over a surface of the sample. A sample stage is configured to support the sample. At least one computer is connected to the metrology instrument and the sample stage and is configured to run a computer program which causes the sample stage to rotate the sample so as to present multiple different locations on the sample to the optical metrology instrument such that the orientation of the nanoimprint structures at the multiple different locations remains fixed with respect to a plane of the focusing optics of the metrology instrument in order to eliminate polarization effects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.