Optical system demonstrating improved resistance to optically degrading external effects
US8867134B2 · kind B2 · utility
37Cited by
161References
77Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2010 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Jul 2, 2031 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD21H21/44
- WIPO fieldOther consumer goods
- WIPO sectorOther fields
Abstract
A system for projecting one or more synthetic optical images, which demonstrates improved resistance to optically degrading external effects, is provided. The inventive system serves to lock the focal length of the focusing elements in place. In other words, no other transparent materials or layers brought into contact with the inventive system will serve to materially alter the focal length or the optical acuity of synthetic images formed by the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.