Method and apparatus for analyzing gait pattern
US8870795B2 · kind B2 · utility
14Cited by
3References
12Claims
0Family size
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Key dates
| Filing date | Nov 14, 2011 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | Apr 19, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG16H50/20
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method and apparatus for recognizing a gait pattern are provided. The method for recognizing a gate pattern includes: obtaining a walker's foot pressure distribution values through a pressure sensor array disposed at the bottom of a pair of shoes; calculating valid pressure points among the foot pressure distribution values; calculating a center of pressure (COP) movement trace by using the valid pressure points; and recognizing the walker's gait pattern by using the COP movement trace.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.