Photoactive compound and photosensitive resin composition comprising the same
US8871430B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 2012 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | May 14, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.