Dual elliptical reflector with a co-located foci for curing optical fibers
US8872137B2 · kind B2 · utility
8Cited by
11References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 14, 2012 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | Nov 27, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/065
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.