Plasma generating apparatus
US8872427B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2011 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | Dec 20, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/22
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma generating apparatus includes: a power supply one of whose electrodes is connected to vacuum chamber walls of N vacuum chambers; an oscillator which outputs a pulse signal at every predetermined period; N pulse amplifying circuits which are connected in parallel to the oscillator as well as to the other electrode of the power supply, and each of which amplifies the pulse signal and supplies the amplified pulse signal to a corresponding one of N electrodes disposed in the N vacuum chambers; and at least (N-1) timing generating circuits which are connected between the oscillator and at least (N-1) pulse amplifying circuits, and which delay the pulse signal by respectively different delay times so that at any specific time, the pulse signal is supplied to only one of the pulse amplifying circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.