Illumination system for use in a stereolithography apparatus
US8873024B2 · kind B2 · utility
20Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2010 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | Jun 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70391
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.