Ophthalmic laser system
US8876808B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2014 |
| Grant date | Nov 4, 2014 |
| Priority date | — |
| Expiry date | Jan 6, 2034 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2009/00891
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An ophthalmic laser system generating a first beam at a wavelength suitable for performing selective laser trabeculoplasty and selectively generating a second beam at a wavelength suitable for performing secondary cataract surgery procedures. The laser system is able to select between directing the first beam or the second beam to the eye of a patient. The first beam is suitably generated at 1064 nm from a Nd:YAG laser and the second beam is frequency doubled to 532 nm in a KTP doubling crystal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.