Method for detecting pattern offset amount of exposed regions and detecting mark
US8883523B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 13, 2011 |
| Grant date | Nov 11, 2014 |
| Priority date | — |
| Expiry date | Sep 28, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for detecting a patter offset amount of exposed regions comprises forming at least one pair of conductive detecting marks with a predetermined position relationship by a patterning process including two exposing processes; detecting an electrical characteristic of the at least one pair conductive detecting marks, if the detected electrical characteristic does not meet a predetermined position relationship, it is determined that the pattern offset amount of the exposed regions in two exposure steps is not qualified; and if the detected electrical characteristic meets the predetermined position relationship, it is determined that the pattern offset amount of the exposed regions in two exposure steps is qualified.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.