Removal of toxic chemicals using metal-organic frameworks (MOFs) post-treated via plasma-enhanced chemical vapor deposition (PECVD) with fluorocarbons
US8883676B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2013 |
| Grant date | Nov 11, 2014 |
| Priority date | — |
| Expiry date | Jun 11, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2253/204
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A system and method of filtering comprising adsorbing a toxic chemical using a metal-organic framework (MOF) compound that has been post-treated with fluorocarbons using plasma-enhanced chemical vapor deposition (PECVD). The toxic chemical may comprise any of ammonia and cyanogen chloride. Furthermore, the toxic chemical may comprise any of an acidic/acid-forming gas, basic/base-forming gas, oxidizer, reducer, and organic gas/vapor. The toxic chemical is physically adsorbed by the MOF compound. Moreover, the toxic chemical interacts with unsaturated metal sites within the MOF. Additionally, the MOF compound may comprise any of Cu-BTC, MOF-177, and an isoreticular metal-organic framework (IRMOF) compound. The MOF compound may comprise a metal-carboxylate bond. Additionally, the MOF compound may be unstable in the presence of moisture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.