Patent · US Active

Burnthrough formulations

US8889471B2 · kind B2 · utility

0Cited by
6References
26Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 7, 2012
Grant dateNov 18, 2014
Priority date
Expiry dateMay 7, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/773
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

For solar cell fabrication, the addition of precursors to printable media to assist etching through silicon nitride or silicon oxide layer thus affording contact with the substance underneath the nitride or oxide layer. The etching mechanism may be by molten ceramics formed in situ, fluoride-based etching, as well as a combination of the two.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.