Patent · US Active

SCR apparatus and method for adjusting the sustaining voltage

US8890259B2 · kind B2 · utility

1Cited by

1References

5Claims

0Family size

Assignee

CSMC TECHNOLOGIES FAB2 CO., LTD. · CN

Inventors

Meng Dai · Shanghai, CN
Zhongyu Lin · Wuxi, CN

Key dates

Filing date	Dec 5, 2011
Grant date	Nov 18, 2014
Priority date	—
Expiry date	Dec 5, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH10D89/713

Abstract

An SCR apparatus includes an SCR structure and a first N injection region. The SCR structure includes a P+ injection region, a P well, an N well and a first N+ injection region, the first N injection region is located under an anode terminal of the P+ injection region of the SCR structure. A method for adjusting a sustaining voltage therefor is provided as well.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.