Plasma-arc vaporization chamber with wide bore
US8893651B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 8, 2008 |
| Grant date | Nov 25, 2014 |
| Priority date | — |
| Expiry date | May 10, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/15
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma-arc vaporization chamber includes features configured to permit very high-energy plasmas, preferably with high hydrogen content. The vaporization chamber includes a female electrode having an internal chamber with a target region made of a conductive material highly resistant to thermal degradation and an isthmus region of sufficient width to slow plasma flow therethrough enough to permit vaporization within the internal chamber of a material delivered into the plasma. The material is preferably injected at an angle counter to the flow of the plasma. The vaporization chamber also includes a flange-cooling chamber adjacent to a flange of the female electrode. Additionally, the chamber preferably includes vortexing gas injectors configured to provide a helical gas flow within at least a portion of the internal chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.