System for reducing microbial levels on the hide of an animal
US8894476B2 · kind B2 · utility
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75References
3Claims
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Assignee
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Key dates
| Filing date | Jan 29, 2014 |
| Grant date | Nov 25, 2014 |
| Priority date | — |
| Expiry date | Jan 29, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02A40/90
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Disclosed is a system for reducing microbial levels on a hide of an animal utilizing a device for contacting the hide of an animal with an alkaline solution having a pH of between about 8 and about 13 after stunning the animal, a second a device for contacting the hide with a second solution that includes one of water, organic acid or hydrogen peroxide and a a device for reusing at least a portion of the alkaline solution or the water/organic acid/hydrogen peroxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.