Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern
US8895227B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 20, 2011 |
| Grant date | Nov 25, 2014 |
| Priority date | — |
| Expiry date | Mar 15, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developing solution is disclosed with which it is possible to develop a photoresist disposed on a substrate including a conductive polymer. Also disclosed is a method for forming a resist pattern using the developing solution. The developing solution contains one or more acids and/or salts thereof, the acids being selected from inorganic acids, amino acids having an isoelectric point less than 7, and carboxylic acids having two or more carboxy groups. Use of this developing solution hence inhibits the phenomenon in which a substrate including a conductive polymer suffers an increase in surface resistivity due to a developing solution, and makes it possible to obtain a fine resist pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.