Patent · US Active

Method for providing a side-chain dendrimer vesicle

US8895674B2 · kind B2 · utility

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6Claims

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Assignee

CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY, ARMAMENTS, BUREAU, MINISTRY OF NATIONAL DEFENSE · TW

Inventors

Wen-Chiung Su · Longqi, TW
Wei-Ho Ting · Taichung, TW
Mao-Syong Lin · Taichung, TW
Chia-Cheng Chang · Hsinchu, TW
Hsin-Cheng Chiu · Bethesda, US
Sheng Dai · Knoxville, US
Ru-Jong Jeng · Taipei, TW

Key dates

Filing date	Jan 23, 2014
Grant date	Nov 25, 2014
Priority date	—
Expiry date	Jan 23, 2034

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08F2438/02
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

A method disclosed for making a side-chain dendrimer vesicle. The method includes the steps of: At first, there is provided a random copolymer with a narrow distribution of molecular weights by active polymerization and chemical modification. Then, chemical modification is executed to graft various generations of dendrimers to the random copolymer to provide a side-chain dendritic random copolymer with various generations. Two steps of emulsification are taken to induce macromolecular self-assembling of the side-chain dendritic random copolymer solution to form the macromolecular vesicle. The side-chain dendrimer includes C10˜C18 hydrophobic alkyl chains.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.