Patent · US Active

Acid-labile polymers and monomers for their construction

US8895691B2 · kind B2 · utility

2Cited by

1References

9Claims

0Family size

Assignee

The Research Foundation of the State University of New York · US

Inventors

Robert L. Brainard · Albany, US
Brian J. Cardineau · Corvallis, US

Key dates

Filing date	Aug 26, 2010
Grant date	Nov 25, 2014
Priority date	—
Expiry date	Jan 24, 2031

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08G63/672
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

Polymers for photoresists and monomers for incorporation into those polymers are disclosed. The polymers comprise at least two components: an acid labile component and a photolytically stable and acid-stable component. The polymers may also contain a third, photoacid generator (PAG) component. The acid-labile component is based on the presence of a readily cleavable oxygen-carbon bond that usually occurs in a sterically hindered ether or ester.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.