Positive tone organic solvent developed chemically amplified resist
US8900802B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 23, 2013 |
| Grant date | Dec 2, 2014 |
| Priority date | — |
| Expiry date | Jun 2, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.