Dispersion composition, photosensitive resin composition, and solid-state image pick-up element
US8908293B2 · kind B2 · utility
3Cited by
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18Claims
0Family size
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Key dates
| Filing date | Nov 17, 2010 |
| Grant date | Dec 9, 2014 |
| Priority date | — |
| Expiry date | Oct 6, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B3/0012
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition which can form a pattern attaining high resolution and having a high refractive index and a high transmittance is provided. The photosensitive resin composition includes a dispersion composition including (A) titanium dioxide particles having an average primary particle diameter of from 1 nm to 100 nm, (B) a graft copolymer that has a graft chain having a number of atoms other than hydrogen atoms in a range of from 40 to 10,000 and (C) a solvent, and (D) a polymerizable compound, and (E) a polymerization initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.