Focus position adjusting apparatus, reticle, focus position adjusting program, and method of manufacturing semiconductor device
US8910096B2 · kind B2 · utility
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5References
20Claims
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Key dates
| Filing date | Jul 24, 2013 |
| Grant date | Dec 9, 2014 |
| Priority date | — |
| Expiry date | Jul 24, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to one embodiment, a step difference estimation unit, an assist pattern generation unit, and a spherical aberration conversion unit are installed. The step difference estimation unit estimates step difference of a processing layer. The assist pattern generation unit adds an assist pattern having different sensitivity to spherical aberration in an exposure process to a mask pattern based on the step difference of the processing layer. The spherical aberration conversion unit converts the step difference of the processing layer into the spherical aberration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.