Substrate treatment installation with adjustable thermal insulation for controlling substrate temperature
US8911231B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 18, 2010 |
| Grant date | Dec 16, 2014 |
| Priority date | — |
| Expiry date | Jun 18, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/56
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate-treatment installation includes a vacuum chamber, a substrate treatment device within the vacuum chamber, a substrate transport device within the vacuum chamber for guiding a substrate along a longitudinal direction in a substrate transport plane past the substrate treatment device, and a device for controlling substrate temperature. The substrate temperature controlling device includes a heat-absorbing cooler on one side of the substrate transport plane and an insulation member selectively displaceable between at least two different positions to vary extent of thermal shielding of the heat-absorbing cooler relative to the substrate transport plane by the insulation member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.