Method and device for coating substrates from the vapor phase
US8911555B2 · kind B2 · utility
0Cited by
16References
18Claims
0Family size
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Key dates
| Filing date | Sep 6, 2010 |
| Grant date | Dec 16, 2014 |
| Priority date | — |
| Expiry date | Oct 27, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/541
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method for coating substrates with materials to be vaporized in a vacuum coating system, the vaporization material is deposited on the substrate by double vaporization using an intermediate carrier. The intermediate carrier is continuously moved and cylindrical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.