Patent · US Active

Radiation-sensitive resin composition

US8916333B2 · kind B2 · utility

0Cited by

3References

6Claims

0Family size

Assignee

JSR CORPORATION · JP

Inventors

Hiroshi Tomioka · Tokyo, JP
Noboru Otsuka · Tokyo, JP
Akimasa Soyano · Somalomo, CM

Key dates

Filing date	Sep 28, 2012
Grant date	Dec 23, 2014
Priority date	—
Expiry date	Dec 25, 2032

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/122
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a formula (a2), and a third structural unit having a lactone structure. A content of the first structural unit in the polymer being 50 mol % or more based on total structural units included in the polymer. The first structural unit is preferably a structural unit shown by a formula (a1-1).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.