Patent · US Active

Method for operating an exhaust gas aftertreatment system with at least one first SCR device and at least one second SCR device

US8920758B2 · kind B2 · utility

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1References

13Claims

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Assignee

Robert Bosch GmbH · DE

Inventors

Andreas Fritsch · Eggstätt, DE
Andreas Holzeder · Zusmarshausen, DE

Key dates

Filing date	Nov 26, 2013
Grant date	Dec 30, 2014
Priority date	—
Expiry date	Nov 26, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02T10/40
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method for operating an exhaust gas aftertreatment system is provided that comprises at least one first SCR device and at least one second SCR device. Furthermore, a dosing device for reactant for supplying the SCR devices is provided upstream of the first SCR device in the exhaust gas flow direction. In one embodiment, a target overall efficiency ηDes of the SCR devices is specified. Using modeling of the exhaust gas aftertreatment system, depending on the target overall efficiency ηDes a target value ⊖1,Des is determined that represents the degree of charge of the first SCR device with reactant. The dosing of the reactant is adjusted accordingly to achieve the target value ⊖1,Des.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.