Method of manufacturing MEMS devices with reliable hermetic seal
US8921128B2 · kind B2 · utility
2Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 29, 2013 |
| Grant date | Dec 30, 2014 |
| Priority date | — |
| Expiry date | Jul 25, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C99/0045
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Manufactured capped MEMS device wafers are tested for hermeticity on a vacuum prober at differing pressures or on a wafer prober at differing temperatures. Resonant frequency testing is conducted. Leaking MEMS devices are distinguished from the remaining MEMS devices on the basis of quality factor (“Q”) measurements obtained from the resonant frequency testing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.