In situ cleaning device for lithographic apparatus
US8921807B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 2, 2012 |
| Grant date | Dec 30, 2014 |
| Priority date | — |
| Expiry date | Jun 20, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1205
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.