Magnification control for lithographic imaging system
US8922750B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 2010 |
| Grant date | Dec 30, 2014 |
| Priority date | — |
| Expiry date | Aug 19, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70266
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a lithographic projection system, a corrective optic in the form of one or more deformable plates is mounted within telecentric image or object space for making one-dimensional or two-dimensional adjustments to magnification. The deformable plate, which can be initially bent under the influence of a preload, contributes weak magnification power that influences the magnification of the projection system by changing the effective focal length in object or image space. An actuator adjusts the amount of curvature through which the deformable plate is bent for regulating the amount of magnification imparted by the deformable plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.