Gas flow guiding device for use in crystal-growing furnace
US8926751B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 2010 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Nov 6, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/108
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a gas flow guiding device for use in a crystal-growing furnace. The gas flow guiding device has an insulation layer enclosing a crucible, a gas inlet mounted in the upper insulation layer, and a gas exit formed in the lateral insulation layer. A plurality of guide plates are radially arranged around the opening of the gas inlet, so that the free surface of the melt is blown by the guided gas flow in such a manner that the gas flow takes the impurity away from the free surface efficiently. As a result, the crystal ingot obtained by solidifying the melt will exhibit a reduced concentration of impurities and an improved crystal quality.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.