Patent · US Active

Plasma source

US8926920B2 · kind B2 · utility

30Cited by

13References

33Claims

0Family size

Assignee

Max-Planck-Gesellschaft zur Föderung der Wissenschaften e.V. · US

Inventors

Gregor Morfill · Birkenfeld, DE
Bernd Steffes · Garching bei München, DE

Key dates

Filing date	May 2, 2008
Grant date	Jan 6, 2015
Priority date	—
Expiry date	Oct 6, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH05H2245/36
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

The invention relates to a plasma source (1) comprising: a conduit (3, 4) carrying a gas flow and an ionization chamber (10) in which a plasma is generated, wherein the ionization chamber (10) is connected to the conduit (3, 4), so that the gas flow in the conduit (3, 4) carries away gas particles out of the ionization chamber (10) thereby reducing the pressure in the ionization chamber (10).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.