Process for deposition and characterization of a coating
US8927052B2 · kind B2 · utility
3Cited by
1References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 24, 2013 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Jun 1, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2252/02
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided herein are processes for depositing a plasma coating on a substrate and coated substrates obtained thereby. More particularly, processes for characterizing a plasma coating on a substrate are provided. The process for depositing a plasma coating includes the step of exposing the substrate to a plasma. The plasma includes at least one coating precursor and one fluorophore other than the coating precursor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.