Patent · US Active

Antimonide-based compound semiconductor with titanium tungsten stack

US8927354B2 · kind B2 · utility

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Key dates

Filing dateMar 11, 2013
Grant dateJan 6, 2015
Priority date
Expiry dateMar 11, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D30/4732

Abstract

An apparatus in one example comprises an antimonide-based compound semiconductor (ABCS) stack, an upper barrier layer formed on the ABCS stack, and a gate stack formed on the upper barrier layer. The upper barrier layer comprises indium, aluminum, and arsenic. The gate stack comprises a base layer of titanium and tungsten formed on the upper barrier layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.