Antimonide-based compound semiconductor with titanium tungsten stack
US8927354B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Mar 11, 2013 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Mar 11, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/4732
Abstract
An apparatus in one example comprises an antimonide-based compound semiconductor (ABCS) stack, an upper barrier layer formed on the ABCS stack, and a gate stack formed on the upper barrier layer. The upper barrier layer comprises indium, aluminum, and arsenic. The gate stack comprises a base layer of titanium and tungsten formed on the upper barrier layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.