Cold plasma treatment devices and associated methods
US8928230B2 · kind B2 · utility
23Cited by
47References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2012 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Sep 14, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2277/10
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A cold plasma treatment device for delivery of a cold plasma to patient treatment area. Gas is fed to a gas compartment where it is energized by an electrode coupled to a pulse source to thereby generate a cold plasma. A dielectric barrier is sandwiched between the gas compartment and the electrode to form a dielectric barrier discharge device. The cold plasma exits the gas compartment via a bottom member having a plurality of holes. Gases that can be used include noble gases such as helium or combinations of noble gases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.