Excimer laser with gas purification
US8929419B1 · kind B1 · utility
13Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2013 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Aug 13, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An excimer laser system in which the expensive noble gases are reclaimed, while the halogen gas is sacrificed, and the impurities developed during operation of the excimer laser are removed. In the approach disclosed a multi-stage gas purifier is used with a single, premix gas bottle containing a halogen-rich laser gas mixture comprising noble, buffer and halogen gas, to maintain the optimum halogen content of the laser, while also maintaining a consistent ratio of noble, buffer and halogen gases without complicated control apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.