Patterning of nanostructures

US8937001B2 · kind B2 · utility

Assignee

• Massachusetts Institute of Technology · US

Inventors

• Joseph M. Jacobson · Newton, US
• David Kong · Lexington, US
• Vikas Anant · Cambridge, US
• Ashley Salomon · Chicago, US
• Saul Griffith · San Francisco, US
• Will DelHagen · Cambridge, US
• Vikrant Agnihotri · Cambridge, US

Key dates

• Filing date: Jan 10, 2012
• Grant date: Jan 20, 2015
• Expiry date: Jan 10, 2032

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S977/891
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A technique for forming nanostructures including a definition of a charge pattern on a substrate and introduction of charged molecular scale sized building blocks (MSSBBs) to a region proximate the charge pattern so that the MSSBBs adhere to the charge pattern to form the feature.