Two pass automated application instrumentation
US8938729B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 12, 2010 |
| Grant date | Jan 20, 2015 |
| Priority date | — |
| Expiry date | Feb 12, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F11/3644
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A two-pass technique for instrumenting an application is disclosed. One pass may be performed statically by analyzing the application and inserting probes while the application is not running. Another pass may be performed dynamically by analyzing data collected by the probes while the application runs to derive metrics for the probes. One or more metrics for each probe may be analyzed to determine whether to dynamically modify the probe. By dynamically modifying the probe, the application does not need to be shut down. Dynamically modifying the probe could include removing the probe from the application or moving the probe to another component (e.g., method) in the application, as examples. For example, the probe might be moved to a component that is either up or down the call graph from the component that the probe is presently in.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.