Glass strengthening and patterning methods
US8938993B2 · kind B2 · utility
3Cited by
9References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2010 |
| Grant date | Jan 27, 2015 |
| Priority date | — |
| Expiry date | Jun 21, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C23/006
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
High intensity plasma-arc heat sources, such as a plasma-arc lamp, are used to irradiate glass, glass ceramics and/or ceramic materials to strengthen the glass. The same high intensity plasma-arc heat source may also be used to form a permanent pattern on the glass surface—the pattern being raised above the glass surface and integral with the glass (formed of the same material) by use of, for example, a screen-printed ink composition having been irradiated by the heat source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.