Coating compositions suitable for use with an overcoated photoresist
US8940472B2 · kind B2 · utility
2Cited by
3References
14Claims
0Family size
Inventors
Key dates
| Filing date | Feb 8, 2010 |
| Grant date | Jan 27, 2015 |
| Priority date | — |
| Expiry date | Oct 27, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/322
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.