Electron beam lithography systems and methods including time division multiplex loading
US8941085B2 · kind B2 · utility
5Cited by
0References
18Claims
0Family size
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Key dates
| Filing date | Jun 10, 2013 |
| Grant date | Jan 27, 2015 |
| Priority date | — |
| Expiry date | Jun 10, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31762
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present disclosure provides a systems and methods for e-beam lithography. One system includes an electron source operable to produce a beam and an array of pixels operable to pattern the beam. Control circuitry is spaced a distance from and coupled to the array of pixels. The control circuitry uses time domain multiplex loading (TMDL) to control the array of pixels.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.