Patent · US Active

Method for shaping and slicing ingots using an aqueous phosphate solution

US8945316B2 · kind B2 · utility

1Cited by
5References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 18, 2011
Grant dateFeb 3, 2015
Priority date
Expiry dateApr 24, 2032

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/46
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method for slicing a workpiece into wafers in which a polyphosphate solution is applied to the workpiece during the slicing process. The method comprises the steps of positioning the workpiece, such as a silicon ingot, in the vicinity of a wire saw that can cut through the workpiece without the use of an abrasive slurry; causing an aqueous polyphosphate solution to contact the workpiece; and causing the wire saw to cut into the workpiece while the polyphosphate solution is in contact with the workpiece. After the workpiece has been cut into wafers, the polyphosphate solution is rinsed off of the wafers. Preferably, the wire saw used in this method is a diamond wire saw.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.