Method and system for processing optical materials for high power laser systems
US8945440B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2011 |
| Grant date | Feb 3, 2015 |
| Priority date | — |
| Expiry date | Jun 5, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/59
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of determining conditioning pulse parameters for an optical element includes directing a pump pulse to impinge on the optical element and directing a probe pulse to impinge on the optical element. The method also includes determining a first time associated with an onset of electronic excitation leading to formation of an absorbing region of the optical element and determining a second time associated with expansion of the absorbing region of the optical element. The method further includes defining a turn-off time for a conditioning pulse between the first time and the second time. According to embodiments of the present invention, pulse shaping of the conditioning pulse enables laser conditioning of optical elements to achieve improvements in their laser induced damage threshold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.