Patent · US Active

Excimer light source

US8946662B2 · kind B2 · utility

2Cited by
2References
31Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 28, 2011
Grant dateFeb 3, 2015
Priority date
Expiry dateSep 28, 2031

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC02F2201/3227
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A light source, with electrodes of alternating polarity attached to a substrate in an excimer ultraviolet (UV) lamp, for generating a plasma discharge between each of the electrodes. The shape of the substrate can shape and control the plasma discharge to reduce exposure of materials susceptible to attack by the halogens. The electrodes can be located such that the plasma discharge occurs in a region where it produces less contact of the halogens with the vulnerable areas of the lamp enclosure. The materials, such as the electrodes, substrate, and envelope, can be selected to withstand corrosive materials. In another embodiment, a plurality of sealed tubes, at least some of which contain an excimer gas are positioned between two electrodes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.