Patent · US Active

Method and system for measuring the resistance of a resistive structure

US8947101B2 · kind B2 · utility

6Cited by
13References
34Claims
0Family size

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Key dates

Filing dateJan 4, 2013
Grant dateFeb 3, 2015
Priority date
Expiry dateAug 5, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R27/16
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Method and system for measuring the resistance of a resistive structure having at least three nodes. A first calibration signal is determined by measuring a voltage at an output of the resistance structure when no calibration current is injected into a third node between the first and second nodes of the structure. A calibration current is then injected into the third node and a second calibration signal is determined. The absolute value of the difference between the first calibration signal and the second calibration signal is determined, the absolute value being proportional to a product of the resistance of the resistive structure and the calibration current.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.