Patent · US Active

Method for electrochemically depositing carbon film on a substrate

US8951401B2 · kind B2 · utility

1Cited by
5References
14Claims
0Family size

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Key dates

Filing dateMay 28, 2010
Grant dateFeb 10, 2015
Priority date
Expiry dateJan 4, 2033

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D9/04
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Dense carbon films are deposited on a conductive substrate by placing the substrate acting as anode in a molten salt electrolyte bath containing a source of carbide ion and applying DC current across the substrate and a counter electrode acting as cathode also placed in the molten salt electrolyte bath. The carbide ions are electrochemically oxidized to deposit a carbon film on the surface of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.