Method for electrochemically depositing carbon film on a substrate
US8951401B2 · kind B2 · utility
1Cited by
5References
14Claims
0Family size
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Key dates
| Filing date | May 28, 2010 |
| Grant date | Feb 10, 2015 |
| Priority date | — |
| Expiry date | Jan 4, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D9/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Dense carbon films are deposited on a conductive substrate by placing the substrate acting as anode in a molten salt electrolyte bath containing a source of carbide ion and applying DC current across the substrate and a counter electrode acting as cathode also placed in the molten salt electrolyte bath. The carbide ions are electrochemically oxidized to deposit a carbon film on the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.