Exposure apparatus for improving alignment accuracy of a pattern generated by light modulating elements
US8953146B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2011 |
| Grant date | Feb 10, 2015 |
| Priority date | — |
| Expiry date | Jun 23, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus is provided with: a conveying device that conveys the subject to be exposed in a given direction; a spatial light modulating device having a plurality of light modulating elements, which are composed of an electro-optical crystalline material and arranged at least in one row in a direction intersecting a conveying direction of the subject to be exposed; an optical beam shaping device that limits the width of light emitted from each light modulating element in the conveying direction to a predetermined width; and a control device that on/off-controls light transmitted through the spatial light modulating device so as to generate a predetermined pattern. The light modulating element is formed tilted by a predetermined angle with respect to an axis parallel to the conveying direction. The control device shifts the optical beam shaping device in the conveying direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.