Patent · US Active

Method for enhancing the yield rate of ball implanting of a substrate of an integrated circuit

US8955735B2 · kind B2 · utility

0Cited by
13References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 17, 2013
Grant dateFeb 17, 2015
Priority date
Expiry dateMay 17, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB23K3/0623
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A method is used for implanting solder balls of an integrated circuit by operating a ball implanting machine. The ball implanting machine includes a suction fixture, an evacuating device, two pivoting and inverting devices, a guide plate, a ball carrier, and a substrate. The suction fixture has a plurality of ball grooves. The guide plate has a plurality of guide holes each aligning with a respective one of the ball grooves of the suction fixture. The ball carrier contains a plurality of solder balls. Thus, each of the solder balls is extended through the respective guide hole of the guide plate into the respective ball groove of the suction fixture, so that the solder balls will not protrude outward from the guide plate and will not interfere with or jam each other during movement of the ball carrier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.