Phase-change memory cell
US8957400B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Jan 14, 2013 |
| Grant date | Feb 17, 2015 |
| Priority date | — |
| Expiry date | Jan 14, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C2213/73
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The memory cell includes a memory area which is formed in a phase-change material pattern based on chalcogenide. An electric p/n-type junction is series-connected between electrodes. The p/n junction is formed in a crystalline area by the interface between first and second doped areas of the phase-change material pattern. The memory area is formed in one of the two doped areas, at a distance from the junction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.