Patent · US Active

Sapphire substrate and method for manufacturing the same and nitride semiconductor light emitting element

US8957433B2 · kind B2 · utility

6Cited by
0References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 14, 2013
Grant dateFeb 17, 2015
Priority date
Expiry dateMar 14, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/882
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A sapphire substrate provided with a plurality of projections on a principal surface on which a nitride semiconductor is grown to form a nitride semiconductor light emitting element. The projections have a substantially triangular pyramidal-shape the projections having a plurality of side surfaces and a pointed top. The side surfaces have an inclination angle of between 53° and 59° from a bottom of the projections. The side surfaces are crystal-growth suppressed surfaces on which a growth of the nitride semiconductor is suppressed relative to a portion of the principal surface located between adjacent projections. A bottom of the projections has a substantially triangular shape having three outwardly curved arc-shaped sides, and each of the side surfaces has a substantially triangular shape having vertexes located at the top of the projection and at both ends of a respective side of the bottom of the projection.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.