Patent · US Active

High-voltage integrated metal capacitor and fabrication method

US8957500B2 · kind B2 · utility

3Cited by
2References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 10, 2012
Grant dateFeb 17, 2015
Priority date
Expiry dateNov 28, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02T10/70
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A high-voltage metal capacitor with easy integration into existing semiconductor manufacturing processes can provide isolation capacitors up to several kilovolts. The capacitor includes a support layer with internal structure, including a lower place, a bond pad on the support layer, an upper plate disposed on the support layer, the upper plate being arranged above the lower plate, a dielectric layer, at least part of which is between the lower and upper plates, and a passivation layer, at least part of which covers at least part of the upper plate and part of the dielectric layer. A first opening extends from the surface through the passivation and dielectric layers to the lower plate, and a second opening extends from the surface through the passivation layer to the upper plate. A method of manufacturing the capacitor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.